Residual Metallic Contamination of Transferred Chemical Vapor Deposited Graphene-Reference-Cited by-同舟云学术

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Residual Metallic Contamination of Transferred Chemical Vapor Deposited Graphene

Published:2015-04-28 Issue:5 Volume:9 Page:4776-4785
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Lupina Grzegorz¹,Kitzmann Julia¹,Costina Ioan¹,Lukosius Mindaugas¹,Wenger Christian¹,Wolff Andre¹,Vaziri Sam²,Östling Mikael²,Pasternak Iwona³,Krajewska Aleksandra³,Strupinski Wlodek³,Kataria Satender⁴,Gahoi Amit⁴,Lemme Max C.⁴,Ruhl Guenther⁵,Zoth Guenther⁵,Luxenhofer Oliver⁶,Mehr Wolfgang¹

Affiliation:

1. IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany

2. School of ICT, KTH Royal Institute of Technology, Isafjordsgatan 22, 16440 Kista, Sweden

3. Institute of Electronic Materials Technology, Wolczynska 133, 01-919 Warsaw, Poland

4. University of Siegen, Hölderlinstr. 3, 57076 Siegen, Germany

5. Infineon Technologies AG, Regensburg 93049, Germany

6. Infineon Technologies Dresden GmbH, Dresden 01099, Germany

Funder

Deutsche Forschungsgemeinschaft

European Commission

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsnano.5b01261

Reference35 articles.

1. Electronics based on two-dimensional materials

2. Photodetectors based on graphene, other two-dimensional materials and hybrid systems

3. A role for graphene in silicon-based semiconductor devices

4. Graphene photonics and optoelectronics

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