Large-Scale 1T′-Phase Tungsten Disulfide Atomic Layers Grown by Gas-Source Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Large-Scale 1T′-Phase Tungsten Disulfide Atomic Layers Grown by Gas-Source Chemical Vapor Deposition

Published:2022-07-18 Issue:8 Volume:16 Page:13069-13081
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Okada Mitsuhiro¹²^ORCID,Pu Jiang³^ORCID,Lin Yung-Chang²,Endo Takahiko⁴^ORCID,Okada Naoya⁵,Chang Wen-Hsin⁵,Lu Anh Khoa Augustin⁶⁷^ORCID,Nakanishi Takeshi⁶,Shimizu Tetsuo²,Kubo Toshitaka²,Miyata Yasumitsu⁴^ORCID,Suenaga Kazu²⁸,Takenobu Taishi³^ORCID,Yamada Takatoshi¹²,Irisawa Toshifumi⁵

Affiliation:

1. Nano Carbon Device Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan

2. Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan

3. Department of Applied Physics, Nagoya University, Nagoya 464-8603, Japan

4. Department of Physics, Tokyo Metropolitan University, Hachioji 192-0397, Japan

5. Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8568, Japan

6. Mathematics for Advanced Materials Open Innovation Laboratory, National Institute of Advanced Industrial Science and Technology (AIST), Sendai 980-8577, Japan

7. International Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), Tsukuba 305-0044, Japan

8. The Institute of Scientific and Industrial Research (ISIR-SANKEN), Osaka University, Osaka 567-0047, Japan

Funder

Ministry of Education, Culture, Sports, Science and Technology

Kazato Research Encouragement Prize

KONDO-ZAIDAN

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsnano.2c05699