Large-Area Deposition of MoS2 by Pulsed Laser Deposition with In Situ Thickness Control-Reference-Cited by-同舟云学术

Large-Area Deposition of MoS2 by Pulsed Laser Deposition with In Situ Thickness Control

Published:2016-05-31 Issue:6 Volume:10 Page:6054-6061
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Serna Martha I.,Yoo Seong H.¹,Moreno Salvador,Xi Yang,Oviedo Juan Pablo,Choi Hyunjoo¹,Alshareef Husam N.²,Kim Moon J.,Minary-Jolandan Majid,Quevedo-Lopez Manuel A.

Affiliation:

1. Department of Advanced Materials Engineering, Kookmin University, Jeongneung-dong Seongbuk-gu, Seoul 136-702, South Korea

2. King Abdullah University of Science and Technology (KAUST), Thuwal, Saudi Arabia

Funder

Departamento Administrativo de Ciencia, Tecnologia e Innovacion

Kookmin University

National Research Foundation of Korea

Division of Electrical, Communications and Cyber Systems

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsnano.6b01636

Reference51 articles.

1. Recent Advances in Two-Dimensional Materials beyond Graphene

2. Atomically ThinMoS2: A New Direct-Gap Semiconductor

3. Emerging Photoluminescence in Monolayer MoS2

4. MoS2 Nanosheet Phototransistors with Thickness-Modulated Optical Energy Gap

5. The chemistry of two-dimensional layered transition metal dichalcogenide nanosheets

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