And There Was Light: Prospects for the Creation of Micro- and Nanostructures through Maskless Photolithography
Author:
Affiliation:
1. Department of Microsystems Engineering (IMTEK), University of Freiburg, Georges-Köhler Allee 103, 79110 Freiburg, Germany
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsnano.7b05593
Reference24 articles.
1. Recent progress in high resolution lithography
2. Cramming More Components Onto Integrated Circuits
3. Swelling Behavior of Thin, Surface-Attached Polymer Networks
4. Electron beam lithography: resolution limits and applications
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