Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer-Reference-Cited by-同舟云学术

Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer

Published:2018-06-01 Issue:6 Volume:12 Page:6193-6202
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Lee Sangho¹^ORCID,Cheng Li-Chen¹^ORCID,Gadelrab Karim R.¹^ORCID,Ntetsikas Konstantinos²^ORCID,Moschovas Dimitrios²,Yager Kevin G.³^ORCID,Avgeropoulos Apostolos²^ORCID,Alexander-Katz Alfredo¹,Ross Caroline A.¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States

2. Department of Materials Science Engineering, University of Ioannina, University Campus-Dourouti, 45110 Ioannina, Greece

3. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States

Funder

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsnano.8b02851

Reference60 articles.

1. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

2. Block Copolymer Self-Assembly–Directed Single-Crystal Homo- and Heteroepitaxial Nanostructures

3. Block Copolymers as a Tool for Nanomaterial Fabrication

4. Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays

5. Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

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