Magnetic Direct-Write Skyrmion Nanolithography

Author:

Ognev A. V.1,Kolesnikov A. G.1ORCID,Kim Yong Jin2,Cha In Ho2,Sadovnikov A. V.34ORCID,Nikitov S. A.34,Soldatov I. V.56,Talapatra A.7,Mohanty J.7ORCID,Mruczkiewicz M.89,Ge Y.10,Kerber N.10,Dittrich F.10,Virnau P.10ORCID,Kläui M.10,Kim Young Keun2ORCID,Samardak A. S.111ORCID

Affiliation:

1. School of Natural Sciences, Far Eastern Federal University, Vladivostok 690950, Russia

2. Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea

3. Laboratory “Metamaterials”, Saratov State University, Saratov 410012, Russia

4. Kotel’nikov Institute of Radioengineering and Electronics, Russian Academy of Sciences, Moscow 125009, Russia

5. Leibniz Institute for Solid State and Material Research (IFW-Dresden), Dresden 01069, Germany

6. Institute of Natural Sciences and Mathematic, Ural Federal University, Yekaterinburg 620075, Russia

7. Indian Institute of Technology, Hyderabad 502285, India

8. Institute of Electrical Engineering, SAS, Bratislava 841 04, Slovakia

9. Centre for Advanced Materials Application (CEMEA), Slovak Academy of Sciences, Bratislava 845 11, Slovakia

10. Institut für Physik, Johannes Gutenberg-Universität Mainz, Mainz 55128, Germany

11. National Research South Ural State University, Chelyabinsk 454080, Russia

Funder

Samsung

Deutscher Akademischer Austauschdienst

European Regional Development Fund

National Research Foundation of Korea

Deutsche Forschungsgemeinschaft

FP7 International Cooperation

Russian Foundation for Basic Research

Johannes Gutenberg-Universit?t Mainz

Ministry of Education and Science of the Russian Federation

Council for Grants of the President of the Russian Federation

Government of the Russian Federation

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

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