All Chemical Vapor Deposition Growth of MoS2:h-BN Vertical van der Waals Heterostructures
Author:
Affiliation:
1. Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsnano.5b00655
Reference41 articles.
1. Van der Waals heterostructures
2. Field-Effect Tunneling Transistor Based on Vertical Graphene Heterostructures
3. Vertical field-effect transistor based on graphene–WS2 heterostructures for flexible and transparent electronics
4. Highly efficient gate-tunable photocurrent generation in vertical heterostructures of layered materials
5. Electroluminescence and Photocurrent Generation from Atomically Sharp WSe2/MoS2 Heterojunction p–n Diodes
Cited by 345 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Modulation of electronic properties and energy band alignments of h-BN/MoS2 heterostructures with different torsion angles by biaxial strain and electric field;Materials Science in Semiconductor Processing;2024-11
2. Introducing 2D layered WS2 and MoS2 as an active catalyst to enhance the hydrogen storage properties of MgH2;International Journal of Hydrogen Energy;2024-10
3. Enhancing the Linear/Nonlinear Optical Properties of MoSe2 via Third-Generation Semiconductor Nanoheterojunctions for Nano-Optoelectronic Devices;ACS Applied Nano Materials;2024-09-10
4. Designing SiO2@NiS2@MoS2 heterostructure for superb potassium-ion storage;Journal of Energy Storage;2024-09
5. Recent Progress of Self-Powered Optoelectronic Devices Based on 2D Materials;Processes;2024-08-16
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3