Electron-Beam-Induced Topographical, Chemical, and Structural Patterning of Amorphous Titanium Oxide Films-Reference-Cited by-同舟云学术

Electron-Beam-Induced Topographical, Chemical, and Structural Patterning of Amorphous Titanium Oxide Films

Published:2006-10-31 Issue:47 Volume:110 Page:23660-23668
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Kern P.¹,Müller Y.¹,Patscheider J.¹,Michler J.¹

Affiliation:

1. Empa, Materials Technology Laboratory, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland, Empa, Laboratory for Metallic Materials, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland, and Empa, Nanoscale Materials Science Laboratory, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp0642589

Reference47 articles.

1. Investigations of TiO2 films deposited by different techniques

2. TiO2/(indium tin oxide) multilayer film: a transparent IR reflector

3. Environmental Applications of Semiconductor Photocatalysis

4. Photocatalysis on TiO2 Surfaces: Principles, Mechanisms, and Selected Results

5. Humidity sensitivity of Nb2O5-doped TiO2 ceramics

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