Photopolymerization Using Metal Oxide Semiconducting Nanoparticles for Epoxy-Based Coatings and Patterned Films

Author:

Riad Keroles B.1ORCID,Arnold Alexandre A.2,Claverie Jerome P.3ORCID,Hoa Suong V.4,Wood-Adams Paula M.1ORCID

Affiliation:

1. Laboratory for the Physics of Advanced Materials, Department of Chemical and Material Engineering, Concordia University, Montreal, QC H3G 1M8, Canada

2. Department of Chemistry, Université du Québec à Montreal (UQAM), Montreal, QC H2L 2C4, Canada

3. Department of Chemistry, Université de Sherbrooke, Sherbrooke, J1K 2R1, Canada

4. Concordia Center for Composites, Department of Mechanical, Industrial and Aerospace Engineering, Concordia University, Montreal, QC H3G 1M8, Canada

Funder

Concordia University

Natural Sciences and Engineering Research Council of Canada

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Reference34 articles.

1. Leubner, W.; Albert, S.; Unruh, C. Light-Sensitive Polymers for Making Printing Plates. Eastman Kodac Co, assignee. US 2861058, November 18, 1958.

2. Barraud, J.; Gervat, S.; Ratovelmanana, V.; Boutevin, B.; Parisi, J.; Cahuzac, A.; Jocteur, R. Polymer Material of the Polyurethane Acrylate Type for Coating an Optical Fiber or for an Optical Fiber Tape. Alcatel Cable, assignee. US5567794, October 22, 1996.

3. Science in three dimensions: The print revolution

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