Functionalized Ag Nanoparticles Embedded in Polymer Resists for High-Resolution Lithography-Reference-Cited by-同舟云学术

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Functionalized Ag Nanoparticles Embedded in Polymer Resists for High-Resolution Lithography

Published:2020-08-04 Issue:9 Volume:3 Page:8651-8661
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Moinuddin Mohamad G.¹,Kumar Rudra¹^ORCID,Yogesh Midathala²,Sharma Shivani¹^ORCID,Sahani Manoj¹,Sharma Satinder K.¹^ORCID,Gonsalves Kenneth E.²

Affiliation:

1. School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, Mandi 175005, Himachal Pradesh, India

2. School of Basic Sciences (SBS), Indian Institute of Technology (IIT)-Mandi, Mandi 175005, Himachal Pradesh, India

Funder

Council of Scientific and Industrial Research

Ministry of Electronics and Information technology

Science and Engineering Research Board

Department of Science and Technology, Ministry of Science and Technology

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.0c01362

Reference61 articles.

1. High power extreme ultra-violet (EUV) light sources for future lithography

2. Extreme ultraviolet resist materials for sub-7 nm patterning

3. EUV lithography process challenges

4. Extreme ultraviolet lithography: A review

5. EUV lithography

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1. Additive-Assisted Forming High-Quality Thin Films of Sn–Oxo Cluster for Nanopatterning;ACS Applied Materials & Interfaces;2024-07-24

2. 极紫外光刻的随机性问题及其研究进展;Chinese Journal of Lasers;2024

3. Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography;ACS Omega;2023-07-23

4. Trends in photoresist materials for extreme ultraviolet lithography: A review;Materials Today;2023-07

5. Structural investigation of zinc‐based photoresists with different substituents for high‐resolution lithography;Applied Organometallic Chemistry;2023-06-20

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