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Imaging Electromigration during the Formation of Break Junctions

Published:2007-02-17 Issue:3 Volume:7 Page:652-656
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Taychatanapat Thiti¹,Bolotin Kirill I.¹,Kuemmeth Ferdinand¹,Ralph Daniel C.¹

Affiliation:

1. Laboratory of Atomic and Solid State Physics, Cornell University, Ithaca, New York 14853

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl062631i

Reference25 articles.

1. Fabrication of metallic electrodes with nanometer separation by electromigration

2. Coulomb blockade and the Kondo effect in single-atom transistors

3. Kondo resonance in a single-molecule transistor

4. The Kondo Effect in C60 Single-Molecule Transistors

5. Coulomb blockade phenomena in electromigration break junctions

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