Tetrachelate Porphyrin Chromophores for Metal Oxide Semiconductor Sensitization: Effect of the Spacer Length and Anchoring Group Position
Author:
Affiliation:
1. Contribution from the Chemistry Department, Rutgers University, 73 Warren Street, Newark, New Jersey 07102, and Center of Molecular Devices, Department of Chemistry, Royal Institute of Technology, Teknikringen 30, SE 100 44 Stockholm, Sweden
Publisher
American Chemical Society (ACS)
Subject
Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis
Link
https://pubs.acs.org/doi/pdf/10.1021/ja068218u
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