Reproducible Performance Improvements to Monolayer MoS2 Transistors through Exposed Material Forming Gas Annealing
Author:
Affiliation:
1. Department of Chemical and Biomolecular Engineering, University of Maryland, College Park, Maryland 20742, United States
2. Theiss Research, La Jolla, California 92037, United States
Funder
National Institute of Standards and Technology
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.9b01486
Reference67 articles.
1. Power-constrained CMOS scaling limits
2. Device Innovation and Material Challenges at the Limits of CMOS Technology
3. Overview of Beyond-CMOS Devices and a Uniform Methodology for Their Benchmarking
4. Extending the road beyond CMOS
5. Device and Architecture Outlook for Beyond CMOS Switches
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Emerging Schemes for Advancing 2D Material Photoconductive-Type Photodetectors;Materials;2023-11-27
2. Improving the Strain Control Performance of MoS2 Monolayer to Develop Flexible Electronics;Advanced Engineering Materials;2023-11-20
3. Enhanced Emission of Molybdenum Disulfide by Organic–Inorganic Hybrid Heterojunctions;Precision Chemistry;2023-07-21
4. Unusual Selective Monitoring of N,N-Dimethylformamide in a Two-Dimensional Material Field-Effect Transistor;ACS Nano;2023-07-17
5. Material processing, performance and reliability of MoS2 field effect transistor (FET) technology- A critical review;Materials Science in Semiconductor Processing;2023-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3