Formation of Phenoxynorbornane Pendant Groups by Acid-Catalyzed Hydroalkoxylation of Poly(hydroxystyrene) and Its Application to Photopatterning-Reference-Cited by-同舟云学术

Formation of Phenoxynorbornane Pendant Groups by Acid-Catalyzed Hydroalkoxylation of Poly(hydroxystyrene) and Its Application to Photopatterning

Published:2019-05-03 Issue:21 Volume:11 Page:19489-19494
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Cyrus Crystal¹,Kamel Hesham¹,Burgoon Hugh¹,Rhodes Jean¹,Thoresen Jennifer¹,Meyer Gerhard A.¹,Paudel Liladhar¹^ORCID,Filson Paul B.¹,Rhodes Larry F.¹^ORCID

Affiliation:

1. Promerus LLC, 9921 Brecksville Road, Brecksville, Ohio 44141, United States

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.9b03309

Reference17 articles.

1. Okoroanyanwu, U. Chemistry and Lithography; SPIE Press: Bellingham; WA, USA, 2010, pp. 158–160.

2. Diazonaphthoquinone-based Resists

3. Thompson, L. F.; Willson, C. G.; Bowden, M. J. Introduction to Microlithography; 2nd ed. American Chemical Society: Washington, D.C. 1994, p. 214–232.

4. Photoresists for microlithography

5. Smith, M. B.; March, J. March’s Advanced Organic Chemistry; John Wiley and Sons: New York, 2001; pp. 996–998.

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