Enhancing the Stability of CH3NH3PbBr3 Nanoparticles Using Double Hydrophobic Shells of SiO2 and Poly(vinylidene fluoride)
Author:
Funder
National Natural Science Foundation of China
Shenzhen Science and Technology Project
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.9b07841
Reference40 articles.
1. A fluorene-terminated hole-transporting material for highly efficient and stable perovskite solar cells
2. In Situ Fabrication of Halide Perovskite Nanocrystal-Embedded Polymer Composite Films with Enhanced Photoluminescence for Display Backlights
3. Piezo-phototronic Effect Enhanced Photodetector Based on CH3NH3PbI3 Single Crystals
4. Lasing from lead halide perovskite semiconductor microcavity system
5. Enhancing the Stability of CH3NH3PbBr3 Quantum Dots by Embedding in Silica Spheres Derived from Tetramethyl Orthosilicate in “Waterless” Toluene
Cited by 62 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Perovskite nanocomposites: synthesis, properties, and applications from renewable energy to optoelectronics;Nano Convergence;2024-09-09
2. Highly Stable CsPbBr3@MoS2 Nanostructures: Synthesis and Optoelectronic Properties Toward Implementation into Solar Cells;Small;2024-08-02
3. Light path management in devices containing halide perovskite materials with a high refractive index;Materials Research Bulletin;2024-07
4. Biocompatible Perovskite Nanocrystals with Enhanced Stability for White Light-Emitting Diodes;ACS Applied Materials & Interfaces;2024-06-19
5. Stabilization of halide perovskites with silicon compounds for optoelectronic, catalytic, and bioimaging applications;InfoMat;2024-05-26
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3