Electroless Plating of NiFeP Alloy on the Surface of Silicon Photoanode for Efficient Photoelectrochemical Water Oxidation-Reference-Cited by-同舟云学术

Electroless Plating of NiFeP Alloy on the Surface of Silicon Photoanode for Efficient Photoelectrochemical Water Oxidation

Published:2020-02-14 Issue:10 Volume:12 Page:11479-11488
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Li Fusheng¹^ORCID,Li Yingzheng¹,Zhuo Qiming¹,Zhou Dinghua¹,Zhao Yilong¹,Zhao Ziqi¹,Wu Xiujuan¹,Shan Yu¹,Sun Licheng¹²^ORCID

Affiliation:

1. State Key Laboratory of Fine Chemicals, Institute of Artificial Photosynthesis, DUT-KTH Joint Education and Research Centre on Molecular Devices, Institute for Energy Science and Technology, Dalian University of Technology, Dalian 116024, China

2. Department of Chemistry, School of Engineering Sciences in Chemistry, Biotechnology and Health, KTH Royal Institute of Technology, Stockholm 10044, Sweden

Funder

Vetenskapsr?det

Energimyndigheten

Ministry of Education of the People's Republic of China

Ministry of Science and Technology of the People's Republic of China

Knut och Alice Wallenbergs Stiftelse

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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