Atomic Layer Deposition of Tin Monosulfide Using Vapor from Liquid Bis(N,N′-diisopropylformamidinato)tin(II) and H2S
Author:
Affiliation:
1. Department of Chemistry and Chemical Biology, Harvard University, 12 Oxford Street, Cambridge, Massachusetts 02138, United States
Funder
Office of Science
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.9b16933
Reference45 articles.
1. Synthesis of N-Heterocyclic Stannylene (Sn(II)) and Germylene (Ge(II)) and a Sn(II) Amidinate and Their Application as Precursors for Atomic Layer Deposition
2. Tin Monosulfide Thin Films Grown by Atomic Layer Deposition Using Tin 2,4-Pentanedionate and Hydrogen Sulfide
3. Atomic Layer Deposition of Tin Monosulfide Thin Films
4. Overcoming Efficiency Limitations of SnS-Based Solar Cells
5. Co-optimization of SnS absorber and Zn(O,S) buffer materials for improved solar cells
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Applications of low-valent compounds with heavy group-14 elements;Chemical Society Reviews;2024
2. Crystalline Tin Disulfide by Low-Temperature Plasma-Enhanced Atomic Layer Deposition as an Electrode Material for Li-Ion Batteries and CO2 Electroreduction;ACS Applied Energy Materials;2023-12-01
3. Strategies to break the trade-off between infrared transparency and conductivity;Progress in Materials Science;2023-07
4. Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films;Wear;2023-06
5. Simple thermal vapor deposition process for and characterization of n-type indium oxysulfide thin films;Journal of Vacuum Science & Technology A;2022-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3