Polymeric Sacrificial Layers for the Control of Microstructure and Porosity of Oxide Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Polymeric Sacrificial Layers for the Control of Microstructure and Porosity of Oxide Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

Published:2003-07-22 Issue:16 Volume:15 Page:3041-3043
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Barranco A.¹,Cotrino J.¹,Yubero F.¹,González-Elipe A. R.¹

Affiliation:

1. Instituto de Ciencia de Materiales de Sevilla and Departamento Quimica Inorgánica, CSIC-Universidad de Sevilla, c/Américo Vespucio s/n, 41092 Sevilla, Spain, and Departamento de Física Atómica, Molecular y Nuclear, Facultad de Física, Universidad de Sevilla, Avda. Reina Mercedes s/n, Sevilla, Spain

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm034023z

Reference9 articles.

1. Cold Plasma Materials Fabrication

2. Synthesis of SiO2 and SiOxCyHz thin films by microwave plasma CVD

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