Structure and Electrochemical Performance of Nitrogen-Doped Carbon Film Formed by Electron Cyclotron Resonance Sputtering
Author:
Affiliation:
1. National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8566, Japan
2. MES-Afty Corporation, 2-35-2 Hyoe, Hachioji, Tokyo 192-0918, Japan.
Publisher
American Chemical Society (ACS)
Subject
Analytical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ac402385q
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