Enhanced Thermoelectric Transport and Stability in Atomic Layer Deposited-HfO2/ZnO and TiO2/ZnO-Sandwiched Multilayer Thin Films-Reference-Cited by-同舟云学术

Enhanced Thermoelectric Transport and Stability in Atomic Layer Deposited-HfO2/ZnO and TiO2/ZnO-Sandwiched Multilayer Thin Films

Published:2020-09-24 Issue:43 Volume:12 Page:49210-49218
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Felizco Jenichi¹,Juntunen Taneli²,Uenuma Mutsunori¹^ORCID,Etula Jarkko³^ORCID,Tossi Camilla²^ORCID,Ishikawa Yasuaki¹⁴,Tittonen Ilkka²^ORCID,Uraoka Yukiharu¹

Affiliation:

1. Division of Materials Science, Graduate School of Science and Technology, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan

2. Department of Electronics and Nanoengineering, Aalto University, FI-00076 Espoo, Finland

3. School of Chemical Technology, Aalto University, FI-00076 Espoo, Finland

4. College of Science and Engineering, Aoyama Gakuin University, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 252-5258, Japan

Funder

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.0c11439

Reference43 articles.