Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics-Reference-Cited by-同舟云学术

Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics

Published:2020-07-15 Issue:32 Volume:12 Page:36688-36694
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Lee Jaebeom¹^ORCID,Ravichandran Arul V.¹,Mohan Jaidah¹,Cheng Lanxia¹,Lucero Antonio T.¹,Zhu Hui¹,Che Zifan¹,Catalano Massimo¹²,Kim Moon J.¹,Wallace Robert M.¹^ORCID,Venugopal Archana³,Choi Woong⁴^ORCID,Colombo Luigi¹³,Kim Jiyoung¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering, The University of Texas at Dallas, 800 West Campbell Road, Richardson, Texas 75080, United States

2. Institute for Microelectronics and Microsystems, CNR-IMM, Via Monterini, 73100 Lecce, Italy

3. Texas Instruments, Dallas, Texas 75243, United States

4. School of Advanced Materials Engineering, Kookmin University, Seoul 02707, Korea

Funder

Kookmin University

National Institute of Standards and Technology

National Research Foundation of Korea

Texas Instruments

Semiconductor Research Corporation

South West Academy of Nanoelectronics