In Situ Localized Surface Plasmon Resonance (LSPR) Spectroscopy to Investigate Kinetics of Chemical Bath Deposition of CdS Thin Films-Reference-Cited by-同舟云学术

In Situ Localized Surface Plasmon Resonance (LSPR) Spectroscopy to Investigate Kinetics of Chemical Bath Deposition of CdS Thin Films

Author:

Taz Humaira¹,Ruther Rose²,Malasi Abhinav³,Yadavali Sagar³,Carr Connor⁴,Nanda Jagjit¹²³,Kalyanaraman Ramki¹³⁴

Affiliation:

1. Bredesen Center, The University of Tennessee Knoxville, Knoxville, Tennessee 37996, United States

2. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States

3. Department of Chemical and Biomolecular Engineering, The University of Tennessee Knoxville, Knoxville, Tennessee 37996, United States

4. Department of Materials Science and Engineering, The University of Tennessee Knoxville, Knoxville, Tennessee 37916, United States

Funder

Army Research Office

Office of Experimental Program to Stimulate Competitive Research

Laboratory Directed Research and Development

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

Reference36 articles.

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