Stability of Terphenyl Self-Assembled Monolayers Exposed under UV Irradiation-Reference-Cited by-同舟云学术

Stability of Terphenyl Self-Assembled Monolayers Exposed under UV Irradiation

Published:2002-12-01 Issue:26 Volume:18 Page:10496-10499
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Ishida Takao¹,Sano Miki¹,Fukushima Hitoshi¹,Ishida Masaya¹,Sasaki Shinya¹

Affiliation:

1. Institute for Mechanical Systems Engineering (IMSE), National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan, Technology Platform Research Center (TPRC), SEIKO-EPSON Corporation, Fujimi Plant 281, Fujimi-machi, Suwa-gun, Nagano 392-8502, Japan

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la0262001

Reference44 articles.

1. Formation and Structure of Self-Assembled Monolayers

2. Thermal Stability of Self-Assembled Monolayers

3. Stability and Self-Exchange in Alkanethiol Monolayers

4. Photopatterning of Self-Assembled Alkanethiolate Monolayers on Gold: A Simple Monolayer Photoresist Utilizing Aqueous Chemistry

5. Photooxidation of thiols in self-assembled monolayers on gold

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