Tuning the Hole Injection Barrier at the Organic/Metal Interface with Self-Assembled Functionalized Aromatic Thiols-Reference-Cited by-同舟云学术

Tuning the Hole Injection Barrier at the Organic/Metal Interface with Self-Assembled Functionalized Aromatic Thiols

Published:2006-11-23 Issue:51 Volume:110 Page:26075-26080
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Chen Wei¹,Huang Chun¹,Gao Xing Yu¹,Wang Li¹,Zhen Chang Gua¹,Qi Dongchen¹,Chen Shi¹,Zhang Hong Liang¹,Loh Kian Ping¹,Chen Zhi Kuan¹,Wee Andrew Thye Shen¹

Affiliation:

1. Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542, Singapore, Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602, Singapore, and Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543, Singapore

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp065821q

Reference44 articles.

1. Energy Level Alignment and Interfacial Electronic Structures at Organic/Metal and Organic/Organic Interfaces

2. Electronic properties of interfaces between model organic semiconductors and metals

3. Charge transfer and doping at organic/organic interfaces

4. Fluorination of copper phthalocyanines: Electronic structure and interface properties

5. Energy level alignment at organic/metal interfaces: Dipole and ionization potential

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