Direct and Reliable Patterning of Plasmonic Nanostructures with Sub-10-nm Gaps-Reference-Cited by-同舟云学术

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Direct and Reliable Patterning of Plasmonic Nanostructures with Sub-10-nm Gaps

Published:2011-08-22 Issue:9 Volume:5 Page:7593-7600
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Duan Huigao¹,Hu Hailong²,Kumar Karthik¹,Shen Zexiang²,Yang Joel K. W.¹

Affiliation:

1. Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research Link, 117602 Singapore

2. School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, 637371 Singapore

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn2025868

Reference40 articles.

1. Plasmonics for extreme light concentration and manipulation

2. High-Resolution Mapping of Electron-Beam-Excited Plasmon Modes in Lithographically Defined Gold Nanostructures

3. Simultaneous Measurements of Electronic Conduction and Raman Response in Molecular Junctions

4. Visualization of Localized Intense Optical Fields in Single Gold−Nanoparticle Assemblies and Ultrasensitive Raman Active Sites

5. Nanogap-engineerable Raman-active nanodumbbells for single-molecule detection

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