A Highly Sensitive Plasmonic DNA Assay Based on Triangular Silver Nanoprism Etching
Author:
Affiliation:
1. Department of Chemistry, National University of Singapore, Singapore 117543
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn5008786
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