Laser-Induced Sub-millisecond Heating Reveals Distinct Tertiary Ester Cleavage Reaction Pathways in a Photolithographic Resist Polymer-Reference-Cited by-同舟云学术

Laser-Induced Sub-millisecond Heating Reveals Distinct Tertiary Ester Cleavage Reaction Pathways in a Photolithographic Resist Polymer

Published:2014-05-15 Issue:6 Volume:8 Page:5746-5756
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Jung Byungki¹,Satish Pratima¹,Bunck David N.¹,Dichtel William R.¹,Ober Christopher K.¹,Thompson Michael O.¹

Affiliation:

1. Department of Materials Science and Engineering and ‡Department of Chemistry and Chemical Biology, Cornell University, Ithaca, New York 14853, United States

Funder

Semiconductor Research Corporation

Intel Corporation

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn500549w

Reference32 articles.

1. Chemical amplification in the design of dry developing resist materials

2. Kinetic Rates of Thermal Transformations and Diffusion in Polymer Systems Measured during Sub-millisecond Laser-Induced Heating

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