Evaluation of the Difference in the Rate Coefficients of F2 + NOx (x = 1 or 2) → F + FNOx by the Stereochemical Arrangement Using the Density Functional Theory
Author:
Affiliation:
1. Plasma Nanotechnology Research Center (PLANT), Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi, Japan 464-8603
Funder
Japan Society for the Promotion of Science
Sumitomo Seika Chemicals Co, Ltd.
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp510886b
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4. Lieberman, M. A.; Lichtenberg, A. J.Principles of Plasma Discharges and Materials Processing,2nd ed.John Wiley & Sons, Inc.:Hoboken, NJ, 2005; p573.
5. Ion‐ and electron‐assisted gas‐surface chemistry—An important effect in plasma etching
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