An Enhanced Sensitivity of Alkanethiolate Self-Assembled Monolayers to Electron Irradiation through the Incorporation of a Sulfide Entity into the Alkyl Chains-Reference-Cited by-同舟云学术

An Enhanced Sensitivity of Alkanethiolate Self-Assembled Monolayers to Electron Irradiation through the Incorporation of a Sulfide Entity into the Alkyl Chains

Published:1999-12-01 Issue:50 Volume:103 Page:11098-11104
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Heister K.¹,Frey S.¹,Gölzhäuser A.¹,Ulman A.¹,Zharnikov M.¹

Affiliation:

1. Angewandte Physikalische Chemie, Universität Heidelberg, Im Neuenheimer Feld 253, 69120 Heidelberg, Germany, and Department of Chemistry and the NSF MRSEC for Polymers at Engineered Interfaces, Polytechnic University, Brooklyn, New York 11201

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp992017d

Reference48 articles.

1. Formation and Structure of Self-Assembled Monolayers

2. X-ray and Low Energy Electron Induced Damage in Alkanethiolate Monolayers on Au-substrates

3. Modification of self-assembled monolayers of alkanethiols on gold by ionizing radiation

4. Modification of alkanethiolate monolayers on Au-substrate by low energy electron irradiation: Alkyl chains and the S/Au interface

5. Scanning tunneling microscopy based lithography of octadecanethiol on Au and GaAs

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