A Bergman Cyclization Approach to Polymers for Thin-Film Lithography-Reference-Cited by-同舟云学术

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A Bergman Cyclization Approach to Polymers for Thin-Film Lithography

Published:2001-05-11 Issue:12 Volume:34 Page:4104-4108
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Chen Xiaohua¹,Tolbert Laren M.¹,Hess Dennis W.¹,Henderson Cliff¹

Affiliation:

1. School of Chemistry and Biochemistry and School of Chemical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ma002071o

Reference19 articles.

Cited by 53 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Angle distortion model for predicting enediyne activation towards Bergman cyclization: an alternate to the distance theory;RSC Advances;2022

2. Recent advances in Garratt-Braverman cyclization: Mechanistic and synthetic explorations;Tetrahedron Letters;2018-08

3. Bergman Cyclization Polymerization;ACTA POLYM SIN;2016

4. Orbital Crossings Activated through Electron Injection: Opening Communication between Orthogonal Orbitals in Anionic C1–C5 Cyclizations of Enediynes;Journal of the American Chemical Society;2016-11-28

5. Gold(I)-Catalyzed Allenyl Cope Rearrangement: Evolution from Asynchronicity to Trappable Intermediates Assisted by Stereoelectronic Switching;Journal of the American Chemical Society;2016-02-23

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