Effect of Support and Reactant on the Yield and Structure of Carbon Growth by Chemical Vapor Deposition
Author:
Affiliation:
1. Department of Chemical Engineering and Department of Physics, Norwegian University of Science and Technology, N-7491, Trondheim, Norway
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp0449760
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