Scanning Tunneling Microscope-Based Replacement Lithography on Self-Assembled Monolayers. Investigation of the Relationship between Monolayer Structure and Replacement Bias-Reference-Cited by-同舟云学术

Scanning Tunneling Microscope-Based Replacement Lithography on Self-Assembled Monolayers. Investigation of the Relationship between Monolayer Structure and Replacement Bias

Published:2004-03-31 Issue:25 Volume:108 Page:8581-8583
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Lewis Matthew S.¹,Gorman Christopher B.¹

Affiliation:

1. Department of Chemistry, North Carolina State University, Box 8204, Raleigh, North Carolina 27695-8204

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp0379244

Reference20 articles.

1. Scanning Probe Lithography Using Self-Assembled Monolayers

2. Chemically Well-Defined Lithography Using Self-Assembled Monolayers and Scanning Tunneling Microscopy in Nonpolar Organothiol Solutions

3. Patterning Mesoscale Gradient Structures with Self-Assembled Monolayers and Scanning Tunneling Microscopy Based Replacement Lithography

4. Supramolecular Assembly on Surfaces: Manipulating Conductance in Noncovalently Modified Mesoscale Structures

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