Electron Attachment to XCN (X = Br, Cl). Competition between X- and CN- Formation
Author:
Affiliation:
1. Institut für Physikalische und Theoretische Chemie der Freien Universität Berlin, Takustrasse 3, D-14195 Berlin, Germany
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry,General Engineering
Link
https://pubs.acs.org/doi/pdf/10.1021/jp962062a
Reference34 articles.
1. Photodetachment threshold of CN− by laser optogalvanic spectroscopy
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3. Measurement of thermal electron dissociative attachment rate constants for halogen gases using a flowing afterglow technique
4. Studies by the electron cyclotron resonance (ECR) technique
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