Precise Pattern Replication of Polymer Blends into Nonuniform Geometries via Reducing Interfacial Tension between Two Polymers-Reference-Cited by-同舟云学术

Precise Pattern Replication of Polymer Blends into Nonuniform Geometries via Reducing Interfacial Tension between Two Polymers

Published:2012-06-25 Issue:27 Volume:28 Page:10238-10245
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Fang Liang¹,Wei Ming¹,Shang Yingrui¹,Kazmer David¹,Barry Carol¹,Mead Joey¹

Affiliation:

1. NSF Center for High-rate Nanomanufacturing, Department of Plastics Engineering, University of Massachusetts Lowell, Lowell, Massachusetts 01854, United States

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la3008409

Reference44 articles.

1. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

2. Nonlithographic Micro- and Nanopatterning of TiO2 Using Polymer Stamped Molecular Templates

3. Fabrication of nanostructures with long-range order using block copolymer lithography

4. Effect of Mesoscale Crystalline Structure on the Field-Effect Mobility of Regioregular Poly(3-hexyl thiophene) in Thin-Film Transistors

5. Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

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