Comparison of the Deposition Behavior of Charged Silicon Nanoparticles between Floating and Grounded Substrates-Reference-Cited by-同舟云学术

Comparison of the Deposition Behavior of Charged Silicon Nanoparticles between Floating and Grounded Substrates

Published:2014-05-27 Issue:22 Volume:118 Page:11946-11953
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Youn Woong-Kyu¹,Lee Sung-Soo¹,Lee Jae-Young¹,Kim Chan-Soo²,Hwang Nong-Moon¹,Iijima Sumio³

Affiliation:

1. Department of Materials Science and Engineering, Seoul National University, Daehak-dong, Gwanak-gu, Seoul 151-744, Republic of Korea

2. Marine Energy Convergence & Integration Laboratory, Korea Institute of Energy Research, Gimnyeong-ri, Gujwa-eup, Jeju-si, Jeju-do, 695-971, Republic of Korea

3. Meijo University, Faculty of Science and Technology (University Professor of Nagoya University, NEC Senior Research Fellow & Director, AIST/Nanotube Research Center) 1-501, Shiogamaguchi, Tenpaku, Nagoya, Aichi 468-8502, Japan

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp5001144

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