Surface Relief Changes in Cholesteric Cyclosiloxane Oligomer Films at Different Temperatures
Author:
Affiliation:
1. Faculty of Chemistry, Lomonosov Moscow State University, Leninskie gory, Moscow, 119991 Russia
2. Faculty of Physics, Lomonosov Moscow State University, Leninskie gory, Moscow, 119991 Russia
Funder
Russian Science Foundation
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcb.5b06643
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