Structural Dynamics of Al2O3/NiAl(110) During Film Growth in NO2-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Structural Dynamics of Al2O3/NiAl(110) During Film Growth in NO2

Published:2017-10-30 Issue:2 Volume:122 Page:788-793
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Mom Rik V.¹,Vermeer Joost¹,Frenken Joost W.M.¹²,Groot Irene M.N¹³^ORCID

Affiliation:

1. Huygens-Kamerlingh Onnes Laboratory, Niels Bohrweg 2, 2333 CA Leiden, The Netherlands

2. Advanced Research Center for Nanolithography, Science Park 110, 1098 XG Amsterdam, The Netherlands

3. Leiden Institute of Chemistry, Einsteinweg 55, 2333 CC Leiden, The Netherlands

Funder

European Commission

Ministerie van Economische Zaken

Ministerie van Onderwijs, Cultuur en Wetenschap

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

http://pubs.acs.org/doi/pdf/10.1021/acs.jpcb.7b06790

Reference42 articles.

1. Theory of the oxidation of metals

2. Metal oxidation kinetics and the transition from thin to thick films

3. Beitrag zur Theorie des Anlaufvorgangs

4. Transport processes during the growth of oxide films at elevated temperature

5. Mechanism for Limiting Thickness of Thin Oxide Films on Aluminum

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Revisiting the Formation of the (√67 × √67)R12.2° Bilayer Oxide on Ni3Al(111) by In Situ STM—Surprises Regarding Oxygen Volume Diffusion;The Journal of Physical Chemistry C;2021-05-06

2. An effective strategy to promote hematite photoanode at low voltage bias via Zr4+/Al3+ codoping and CoOx OER co-catalyst;Electrochimica Acta;2019-10

3. Tungsten deposits facilitate oxidation of the NiAl(110) surface;The Journal of Chemical Physics;2019-03-28

4. Functionalization and passivation of ultrathin alumina films of defined sub-nanometer thickness with self-assembled monolayers;Journal of Physics: Condensed Matter;2018-09-28

5. Imaging the confined surface oxidation of Ni3Al(111) by in situ high temperature scanning tunneling microscopy;Physical Chemistry Chemical Physics;2018

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3