Photoinduced Reorientation and Surface Relief Formation in Diblock and Random Copolymers with Benzoic Acid and Alkyloxy Side Groups
Author:
Affiliation:
1. Department of Applied Chemistry, Graduate School of Engineering, University of Hyogo, Shosha, Himeji 671-2280, Japan
Funder
Japan Society for the Promotion of Science
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.8b01071
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1. Photoalignment of Liquid Crystalline Materials
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5. Rewritable holograms based on azobenzene-containing liquid-crystalline polymers
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