Polymorphism in Halogen-Ethane Derivatives: CCl3–CCl3 and ClF2C

Polymorphism in Halogen-Ethane Derivatives: CCl3–CCl3 and ClF2C–CF2Cl

Published:2013-01-17 Issue:2 Volume:13 Page:782-791
ISSN:1528-7483
Container-title:Crystal Growth & Design
language:en
Short-container-title:Crystal Growth & Design

Author:

Negrier Philippe¹,Tamarit Josep Ll.²,Barrio María²,Mondieig Denise¹

Affiliation:

1. Université de Bordeaux, LOMA, UMR 5798, F-33400 Talence, France CNRS, LOMA, UMR 5798, F-33400 Talence, France

2. Grup de Caracterització de Materials, Department de Física i Enginyeria Nuclear, ETSEIB, Diagonal 647, Universitat Politècnica de Catalunya, 08028 Barcelona, Catalonia, Spain

Publisher

American Chemical Society (ACS)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cg301498f

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