Etching of Graphene Devices with a Helium Ion Beam-Reference-Cited by-同舟云学术

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Etching of Graphene Devices with a Helium Ion Beam

Published:2009-09-22 Issue:9 Volume:3 Page:2674-2676
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Lemme Max C.¹,Bell David C.²³,Williams James R.¹²,Stern Lewis A.⁴,Baugher Britton W. H.⁵,Jarillo-Herrero Pablo⁵,Marcus Charles M.¹

Affiliation:

1. Department of Physics

2. School of Engineering and Applied Sciences, and

3. Center for Nanoscale Systems, Harvard University, Cambridge Massachusetts 02138

4. Carl Zeiss SMT, Inc., Peabody, Massachusetts 01960

5. Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn900744z

Reference19 articles.

1. Electric Field Effect in Atomically Thin Carbon Films

2. The rise of graphene

3. A Graphene Field-Effect Device

4. Energy Band-Gap Engineering of Graphene Nanoribbons

5. Graphene nano-ribbon electronics

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1. Structural evolution and microscopic mechanisms of atomically precise edge graphene nanoribbons prepared by chemical functionalization-assisted cutting;Materials Today Communications;2024-08

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3. Advancing wastewater treatment from cadmium contamination via functionalized graphene nanosheets;Journal of Water Process Engineering;2024-06

4. Mechanical behaviour and micro-mechanism of atomically precise edge graphene nanoribbons mechanical cutting guided by hydrogen atom adsorption;Diamond and Related Materials;2024-05

5. Selective etching of multilayer graphene with ultra-low impact energy oxygen ions;Applied Surface Science;2024-05

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