Adsorption of Thiophene on the RuS2 (100) and (111) Surfaces: A Laplacian of the Electronic Charge Density Study-Reference-Cited by-同舟云学术

Adsorption of Thiophene on the RuS2 (100) and (111) Surfaces: A Laplacian of the Electronic Charge Density Study

Published:2002-11-21 Issue:51 Volume:106 Page:13242-13249
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Aray Yosslen¹,Rodríguez Jesus¹,Vega David¹,Coll Santiago¹,Rodríguez-Arias Eloy Nouel¹,Rosillo Felix¹

Affiliation:

1. Centro de Quimica, IVIC, Apartado 21827, Caracas 1020 A, Venezuela, Physical and Chemical Properties Division, National Institute of Standards and Technologies, NIST, Gaithersburg, Maryland 20899, FACYT, Universidad de Carabobo, Valencia, Venezuela, Laboratorio de Modelaje de Catálisis, Departamento de Química, Universidad Simón Bolivar, Caracas, Venezuela, and Facultad Experimental de Ciencias, Departamento de Química, Universidad del Zulia, Maracaibo, Venezuela

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp021692b

Reference49 articles.

1. Weisser, O.; Landa, S.Sulfide Catalysts: Their Properties andApplications; Pergamon: Oxford, 1973.

2. Adsorption of thiophene on surfaces of clean and Ni-promoted molybdenum sulfide

3. Hydrodesulfurization catalysis by transition metal sulfides

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