Lateral Temperature-Gradient Method for High-Throughput Characterization of Material Processing by Millisecond Laser Annealing
Author:
Affiliation:
1. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, United States
2. Department of Chemical and Biomolecular Engineering, Cornell University, Ithaca, New York 14853, United States
Funder
Division of Graduate Education
Intel Foundation
Semiconductor Research Corporation
U.S. Department of Defense
Publisher
American Chemical Society (ACS)
Subject
General Chemistry,General Medicine
Link
https://pubs.acs.org/doi/pdf/10.1021/acscombsci.6b00043
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1. Combinatorial and High-Throughput Screening of Materials Libraries: Review of State of the Art
2. Getter sputtering system for high-throughput fabrication of composition spreads
3. High-Throughput Evaluation of Dealloyed Pt–Zn Composition-Spread Thin Film for Methanol-Oxidation Catalysis
4. Effect of Annealing Temperature on Dielectric Constant and Bonding Structure of Low-kSiCOH Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition
5. Nanocrystalline-silicon superlattice produced by controlled recrystallization
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