Simple Approach to Wafer-Scale Self-Cleaning Antireflective Silicon Surfaces-Reference-Cited by-同舟云学术

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Simple Approach to Wafer-Scale Self-Cleaning Antireflective Silicon Surfaces

Published:2009-06-18 Issue:14 Volume:25 Page:7769-7772
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Qi Dianpeng¹,Lu Nan¹,Xu Hongbo¹,Yang Bingjie¹,Huang Chunyu¹,Xu Miaojun¹,Gao Liguo¹,Wang Zhouxiang¹,Chi Lifeng¹²

Affiliation:

1. State Key Laboratory of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, P. R. China

2. Physikalisches Institut and Center for Nanotechnology (C198eNTech), Westfälische Wilhelms-Universität Münster, D-48149 Münster, Germany

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la9013009

Reference28 articles.

1. Preparation of Transparent Superhydrophobic Boehmite and Silica Films by Sublimation of Aluminum Acetylacetonate

2. A Novel Silicon Nanotips Antireflection Surface for the Micro Sun Sensor

3. Biomimetic Antireflective Si Nanopillar Arrays

4. ZnO Nanostructures as Efficient Antireflection Layers in Solar Cells

5. Super-Hydrophobic Surfaces: From Natural to Artificial

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