Atomic Layer Deposition of MgF2 Thin Films Using TaF5 as a Novel Fluorine Source-Reference-Cited by-同舟云学术

Atomic Layer Deposition of MgF2 Thin Films Using TaF5 as a Novel Fluorine Source

Published:2008-06-21 Issue:15 Volume:20 Page:5023-5028
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Pilvi Tero¹,Puukilainen Esa¹,Kreissig Ulrich¹,Leskelä Markku¹,Ritala Mikko¹

Affiliation:

1. Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 University of Helsinki, Finland, Institute of Ion Beam Physics and Materials Research, Forschungszentrum Rossendorf, P.O. Box 510119, 01314 Dresden, Germany

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm800948k

Reference36 articles.

1. Nanoporous structure of a GdF_3 thin film evaluated by variable angle spectroscopic ellipsometry

2. Ion-assisted deposition of lanthanum fluoride thin films

3. Vacuum ultraviolet thin films 1: Optical constants of BaF_2, CaF_2, LaF_3, MgF_2, Al_2O_3, HfO_2, and SiO_2 thin films

4. Atomic force microscopy on cross-sections of optical coatings: a new method

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