A positive tone plasma-developable resist obtained by gas-phase image reversal-Reference-Cited by-同舟云学术

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A positive tone plasma-developable resist obtained by gas-phase image reversal

Published:1992-11-01 Issue:6 Volume:4 Page:1364-1368
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

MacDonald Scott A.,Schlosser Hubert,Clecak Nicholas J.,Willson C. Grant,Frechet Jean M. J.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm00024a043

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