Long-Range Ordering of Diblock Copolymers Induced by Droplet Pinning-Reference-Cited by-同舟云学术

Long-Range Ordering of Diblock Copolymers Induced by Droplet Pinning

Published:2003-10-16 Issue:23 Volume:19 Page:9910-9913
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Kimura Masahiro¹,Misner Matthew J.¹,Xu Ting¹,Kim Seung Hyun¹,Russell Thomas P.¹

Affiliation:

1. Films & Film Products Research Laboratories, Toray Industries, Inc., 1-1, Sonoyama 1-chome, Otsu, Shiga 520-8558, Japan, and Polymer Science and Engineering Department, University of Massachusetts Amherst, Massachusetts 01003

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la0351360

Reference30 articles.

1. Nanolithographic templates from diblock copolymer thin films

2. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

3. Transfer of a chemical substrate pattern into an island-forming diblock copolymer film

4. Asymmetric Block Copolymers with Homopolymers: Routes to Multiple Length Scale Nanostructures

Cited by 169 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of heterogenous wettability on evaporation from a simulated soil pore: Stick-slip evaporative mode and contact line motion;AIP Advances;2024-03-01

2. Molecular-weight effects of a homopolymer on the AB- and ABC-stacks of perforations in block copolymer/homopolymer films;Soft Matter;2024

3. Pattern Formation in Evaporative Drying of a Polymer Solution Droplet over a Soft Swellable Substrate;Langmuir;2023-06-29

4. Analytical solutions for modelling the evaporation of sessile drops;Applied Mathematical Modelling;2023-02

5. Processive Pathways to Metastability in Block Copolymer Thin Films;Polymers;2023-01-18