Interfacial Water on Cl- and H-Terminated Si(111) Surfaces from First-Principles Calculations
Author:
Affiliation:
1. Dipartimento di Fisica “G. Galilei”, Università di Padova, via Marzolo 8, I-35131 Padova, Italy, and DEMOCRITOS National Simulation Center, Trieste, Italy
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp0618781
Reference27 articles.
1. The interaction of water with solid surfaces: Fundamental aspects
2. The interaction of water with solid surfaces: fundamental aspects revisited
3. A molecular picture of hydrophilic and hydrophobic interactions from ab initio density functional theory calculations
4. Water adsorption on metal surfaces: A general picture from density functional theory studies
5. The structure and crystallization of thin water films on Pt(111)
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