Orientation of Block Copolymer Resists on Interlayer Dielectrics with Tunable Surface Energy-Reference-Cited by-同舟云学术

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Orientation of Block Copolymer Resists on Interlayer Dielectrics with Tunable Surface Energy

Published:2009-11-13 Issue:1 Volume:43 Page:461-466
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Suh Hyo Seon¹²,Kang Huiman³,Liu Chi-Chun³,Nealey Paul F.³,Char Kookheon¹²

Affiliation:

1. Interdisciplinary Program in Nano-Science and Technology

2. Center for Functional Polymer Thin Films and School of Chemical and Biological Engineering, Seoul National University, Seoul 151-744, Korea

3. Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ma901987q

Reference37 articles.

1. International Technology Roadmap for Semiconductors, ITRS 2007 Edition.www.itrs.net/Links/2007ITRS/2007_Chapters/2007_ERM.pdf.

2. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

3. Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock Copolymer Templates

4. Erratum to: ‘Enabling nanotechnology with self assembled block copolymer patterns’ [Polymer 44 (23) 6725–6760]

5. Graphoepitaxy of Spherical Domain Block Copolymer Films

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2. Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments;Quantum Beam Science;2020-03-27

3. Photoinduced Modulation of Polymeric Interfacial Behavior Controlling Thin-Film Block Copolymer Wetting;Langmuir;2020-03-10

4. Effects of the Density of Chemical Cross-links and Physical Entanglements of Ultraviolet-Irradiated Polystyrene Chains on Domain Orientation and Spatial Order of Polystyrene-block-Poly(methyl methacrylate) Nano-Domains;Langmuir;2019-10-02

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