Electrochemistry in Ultrahigh Vacuum: Underpotential Deposition of Al on Polycrystalline W and Au from Room Temperature AlCl3/1-Ethyl-3-methylimidazolium Chloride Melts-Reference-Cited by-同舟云学术

Electrochemistry in Ultrahigh Vacuum: Underpotential Deposition of Al on Polycrystalline W and Au from Room Temperature AlCl3/1-Ethyl-3-methylimidazolium Chloride Melts

Published:2005-05-13 Issue:22 Volume:109 Page:11296-11300
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Johnston Matthew¹,Lee Jae-Joon¹,Chottiner Gary S.¹,Miller Barry¹,Tsuda Tetsuya¹,Hussey Charles L.¹,Scherson Daniel A.¹

Affiliation:

1. Department of Chemistry, Case Western Reserve University, Cleveland, Ohio 44106, Departments of Physics, Case Western Reserve University, Cleveland, Ohio 44106, Department of Applied Chemistry, Konkuk University, Chungju, Korea, and Department of Chemistry and Biochemistry, The University of Mississippi, University, Mississippi 38677

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp051243m

Reference22 articles.

1. Room temperature haloaluminate ionic liquids. Novel solvents for transition metal solution chemistry

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