Ab Initio Calculations of the Reaction Mechanisms for Metal−Nitride Deposition from Organo-Metallic Precursors onto Functionalized Self-Assembled Monolayers-Reference-Cited by-同舟云学术

Ab Initio Calculations of the Reaction Mechanisms for Metal−Nitride Deposition from Organo-Metallic Precursors onto Functionalized Self-Assembled Monolayers

Published:2005-12-22 Issue:3 Volume:128 Page:836-847
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Haran Mohit¹,Engstrom James R.¹,Clancy Paulette¹

Affiliation:

1. Contribution from the School of Chemical and Biomolecular Engineering, Cornell University, Ithaca, New York 14853

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja054685k

Reference60 articles.

1. Feedback Connections to the Lateral Geniculate Nucleus and Cortical Response Properties

2. Energy Level Alignment and Interfacial Electronic Structures at Organic/Metal and Organic/Organic Interfaces

Cited by 29 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhancement of Conformality of Silicon Nitride Thin Films by ABC‐Type Atomic Layer Deposition;Advanced Electronic Materials;2023-12-18

2. Adsorption of Titanium Halides on Nitride and Oxide Surfaces during Atomic Layer Deposition: A DFT Study;Coatings;2020-07-23

3. Computational Investigation of Electronic and Steric Effects in Surface Reactions of Metalorganic Precursors on Functionalized Silicon Surfaces;The Journal of Physical Chemistry C;2015-06-04

4. In situ reaction mechanism studies on the Ti(NMe2)2(OiPr)2-D2O and Ti(OiPr)3[MeC(NiPr)2]-D2O atomic layer deposition processes;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-01

5. ALD Simulations;Atomic Layer Deposition for Semiconductors;2013-10-19